EOSAM: near-IR transparent conductive amorphous WO_3-x thin layers by non-reactive RF-sputtering

With growing demand for transparent conductive materials, this work explores amorphous WO_3-x thin films as a promising alternative. Smooth, compact films were fabricated by RF-sputtering and enhanced via post-annealing, leading to improved near-IR transparency and a competitive figure of merit, highlighting their potential for next-generation optoelectronic applications.